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Tantalum silicide (TaSi2)

Tantalum disilicide (TaSi2) has excellent properties such as high melting point, low resistivity, corrosion resistance, high temperature oxidation resistance and good compatibility with silicon, carbon and other basic materials. It is mainly used in electrical heating elements, high temperature structural components, grid materials, integrated circuit connection lines, high temperature oxidation resistance coating, metal ceramics, ceramic matrix composites and aerospace, engine and other fields.
Model:TaSi2 0008
APS(D50):-100+325mesh
Purity(%):>99.9
Fluidity:8S/50g
C (%):≤0.05
O (%):≤0.30
CAS NO.:12039-79-1
EINECS (EC NO.):235-081-3
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Tantalum disilicide (TaSi2)
Product Description
Tantalum disilicide (TaSi2) has excellent properties such as high melting point, low resistivity, corrosion resistance, high temperature oxidation resistance and good compatibility with silicon, carbon and other basic materials. It is mainly used in electrical heating elements, high temperature structural components, grid materials, integrated circuit connection lines, high temperature oxidation resistance coating, metal ceramics, ceramic matrix composites and aerospace, engine and other fields.
Product Features
1. High purity, no impurity phase detected by XRD, low content of metal impurity elements detected by GDMS/ICP;
2. Concentrated particle size distribution, good sphericity, good fluidity, no tube blocking, good quality of 3D printing and thermal spraying.
Technical Specification
Model APS(D50) Purity(%) Fluidity O (%) C (%) Si (%)
TaSi2 0003 10.0-60.0um >99.5 12 S/50g ≤0.50 ≤0.05 22.5~23.7
TaSi2 0008 -100+325mesh >99.9 8  S/50g ≤0.30 ≤0.05 22.5~23.7
Application areas: plasma spraying, thermal cladding, 3D printing(Customized chemical composition and particle size can be made according to customer requirements.)
 
Model APS(D50) Particle size distribution range
TaSi2  0003 10.0-60.0um <10.0um   ≯10%,>60.0um≯5%,10-60um≥80%
TaSi2 0008 -100+325mesh <325mesh≯10%,>100mesh≯5%,-100+325mesh≥80%
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