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Tantalum powder (Ta)

Tantalum powder has a series of excellent properties such as high melting point, low vapor pressure, good cold working performance, high chemical stability, strong resistance to liquid metal corrosion, and large surface oxide film dielectric constant.
Model:Ta-001
APS(D50):-325mesh
Purity(%):99.5~99.9%
C(%):≤0.05
N (%):≤0.05
O (%):≤0.2
CAS NO.:7440-25-7
EINECS (EC NO.):231-135-5
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Tantalum powder
Product Description
Product overview:Tantalum powder has a series of excellent properties such as high melting point, low vapor pressure, good cold working performance, high chemical stability, strong resistance to liquid metal corrosion, and large surface oxide film dielectric constant. It is used in electronics, metallurgy, steel, chemical , cemented carbide, atomic energy, superconducting technology, automotive electronics, aerospace, medical and health, scientific research and other high-tech fields have important applications.
Main properties:Tantalum powder has high purity (99.95%), low oxygen content (500ppm), and small particle size (1-3um).
Precautions:This product should be stored in a cool, dry room to avoid heavy pressure. It should not be exposed to the air during use, so as to avoid moisture absorption and agglomeration, which will affect the dispersion performance and use effect. Unused products should be sealed or stored in a vacuum after unpacking.

size distribution report of Tantalum powder
Product features
Tantalum powder has high purity (99.95%), low oxygen content (500ppm), and small particle size (1-3um).
Technical Data
Model Average Particle Size (D50) Purity(%) O(%) N(%) C(%) H(%)
Ta-001 -325mesh 99.5~99.9% ≤0.2 ≤0.05 ≤0.05 ≤0.01
Ta-002 1-10um 99.0~99.5% ≤0.5 ≤0.05 ≤0.05 ≤0.05
Customized chemical composition and particle size can be made according to customer requirements.
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