Tungsten disilicide (WSi2) has a density of 9.3g/cm3 and a melting point of 2160℃. It has good oxidation resistance, and is soluble in “aqua regia with hydrogen fluoride”(a mixture of concentrated hydrofluoric acid (HF) and concentrated supernitric acid (HNO3)10), but insoluble in water. The chemical properties of WSi2 are as follows: it can react violently with many substances, such as strong acids, fluorine, oxidants and halogen compounds.
Tungsten disilicide (WSi2) is often used as an electric shock material in microelectronics, and the resistance is 80μΩcm. It is also often used in the diverter of poly-silicon wire to increase the conductivity and signal speed of the poly-silicon wire.
